Navigator II - RF Match Networks

Rapid, Accurate, and Reliable Digitally-Tuned Matching

The Navigator ll matching network’s advanced digital technology speeds tuning and match response time.

  • Leading RF plasma methodology and control
  • Advanced pulsing control with tune-while-pulsing capability
  • Unprecedented insights into plasma with the integrated Z’Scan II
  • Digital architecture with model-based rapid tuning algorithms
  • Pulsed RF power delivery
  • Sweep frequency operation
  • Intermodulation distortion (IMD) immunity for multi-frequency applications
  • Real-time process power and impedance measurement
  • Digital architecture with model-based rapid tuning algorithms
  • Pulsed RF power delivery
  • Sweep frequency operation
  • Intermodulation distortion (IMD) immunity for multi-frequency applications
  • Real-time process power and impedance measurement
  • Digital architecture with model-based rapid tuning algorithms
  • Pulsed RF power delivery
  • Sweep frequency operation
  • Intermodulation distortion (IMD) immunity for multi-frequency applications
  • Real-time process power and impedance measurement
  • Digital architecture with model-based rapid tuning algorithms
  • Pulsed RF power delivery
  • Sweep frequency operation
  • Intermodulation distortion (IMD) immunity for multi-frequency applications
  • Real-time process power and impedance measurement
<
>

The Navigator® ll is equipped with microprocessor-controlled, stepper-motor drives, and advanced tuning algorithms — enabling optimized RF power. An optional internal Z’Scan® II RF sensor provides real-time analysis of process power and impedance — allowing you to quickly identify and significantly reduce process variability. Optional Virtual Front Panel software is available for monitoring and control through a user’s computer

     Benefits

  • Speedily tune and improve match response time
  • Tighten process control
  • Increase tool throughput and product yield
  • Improve reliability and cost of ownership
  • Customize across a variety of chambers and processes

Power
1 to 30 kW

Frequency
400 kHz to 60 MHz

Other
Single and multiple frequency capable, ICP and CCP capable